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  • Publication Date: December 31, 1969
  • Publication Number: US-6371134-B1

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      US-2003196681-A1October 23, 2003Ching-Ping Wu, H. W. Lee, Szu-Cheng Huang, Nan-Tzu Lian, Hsin-Cheng LiuEliminating residual polymer in the cleaning process of post pad etching
      US-6955177-B1October 18, 2005Novellus Systems, Inc.Methods for post polysilicon etch photoresist and polymer removal with minimal gate oxide loss
      US-7846266-B1December 07, 2010Kla-Tencor Technologies CorporationEnvironment friendly methods and systems for template cleaning and reclaiming in imprint lithography technology